Application: Improve Uniformity

​There are several methods available for improving the thickness uniformity of a material via physical vapor deposition (PVD). Tin Model programs let you investigate all of them with ease. 

The use of correction masks is a common technique, but it is by no means the only technique available. In many situations, an alternative techniques is more effective. 

Adjustments of source position and orientation can often result in significant improvement in thickness uniformity over a large area. 

​Tilting the axis of a planet, when possible, can often bring about superb thickness uniformity. 

When substrates are small in comparison to the substrate carrier, substrate terracing can be very effective in achieving uniformity. 

When coating lenses, location-varied tilt angles can be employed for centering thickness contours for all lenses in a full load. 

Please view Case Studies for an example.
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